Controlled self-assembly of nanocrystalline arrays studied by 3D kinetic monte carlo modeling

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DOIResolve DOI: http://doi.org/10.1021/jp205791t
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TypeArticle
Journal titleThe Journal of Physical Chemistry C
ISSN1932-7447
Volume115
Issue40
Pages1955719568; # of pages: 12
SubjectControlled self-assembly; Crystalline substrates; Kinetic Monte Carlo modeling; Metallic islands; Nanocrystallines; Process condition; Self assembly process; Self-assembled arrays; Sensing applications; Theoretical study; Wetting conditions; Deposition rates; Models; Monte Carlo methods; Morphology; Physical vapor deposition; Three dimensional computer graphics
AbstractFabrication of self-assembled arrays of nanocrystals (NCs) by physical vapor deposition (PVD) is a promising technique rated highly for its potential for various electronic, photonic, and sensing applications. However, the self-assembly process is not straightforward to control and direct in a desired way. A detailed understanding of how to control the size, shape, and density of self-assembled NCs by varying the accessible PVD process conditions, such as deposition rate, duration, or temperature, is critical for the potential of self-assembled nanofabrication to be fully realized. In this paper, we report a systematic kinetic Monte Carlo modeling that explicitly represents PVD synthesis of self-assembled metallic NCs on a crystalline substrate. We investigate how varying the duration of deposition, deposition rate, temperature, and substrate wetting conditions may affect the morphologies of arrays of self-assembled metallic islands and compare our results with previously reported experimentally observed surface morphologies generated by PVD and theoretical studies. © 2011 American Chemical Society.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); National Institute for Nanotechnology
Peer reviewedYes
NPARC number21271929
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Record identifier0037b133-73f4-4352-b7ea-9d7659c687ce
Record created2014-05-06
Record modified2017-03-23
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