Polarization-selective etching in femtosecond laser-assisted microfluidic channel fabrication in fused silica

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DOIResolve DOI: http://doi.org/10.1364/OL.30.001867
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TypeArticle
Journal titleOptics Letters
ISSN0146-9592
Volume30
Issue14
Pages18671869; # of pages: 3
Subjectlaser materials processing; micro-optical devices; microstructure fabrication
AbstractWe fabricate microchannels in fused silica by femtosecond laser irradiation followed by etching in diluted hydrofluoric acid. We show a dramatic dependence of the etch rate on the laser polarization, spanning 2 orders of magnitude. We establish the existence of an energy-per-pulse threshold at which etching of the laser-modified zones becomes highly polarization selective. The enhanced selective etching is due to long-range, periodic, polarization-dependent nanostructures formed in the laser-modified material.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada
Peer reviewedYes
Identifier10038632
NPARC number12339171
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Record identifier06499752-0f0b-4708-85cb-5226381a0c5e
Record created2009-09-11
Record modified2016-05-09
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