Interfacial Layer Formation in Gd2O3 Films Deposited Directly on Si(0 0 1)

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DOIResolve DOI: http://doi.org/10.1016/S0169-4332(01)00014-9
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TypeArticle
Journal titleApplied Surface Science
Volume173
Issue3-4
Pages318326; # of pages: 9
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; NRC Institute for National Measurement Standards
Peer reviewedNo
NPARC number12744214
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Record identifier09672c18-8c5e-4b5f-8e35-8c31528a8d91
Record created2009-10-27
Record modified2016-05-09
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