Disassembling glancing angle deposited films for high-throughput, single-post growth scaling measurements

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DOIResolve DOI: http://doi.org/10.1017/S1431927612001080
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TypeArticle
Journal titleMicroscopy and Microanalysis
ISSN1431-9276
1435-8115
Volume18
Issue05
Pages11351142; # of pages: 8
SubjectGLAD; growth; broadening; disassembling; isolating; scaling; single post
AbstractWith growing interest in nanostructured thin films produced by glancing angle deposition (GLAD), it becomes increasingly important to understand their overall growth mechanics and nanocolumn structure. We present a new method of isolating the individual nanocolumns of GLAD films, facilitating automated measurement of their broadening profiles. Data collected for α = 81° TiO2 vertical nanocolumns deposited across a range of substrate rotation rates demonstrates that these rates influence growth scaling parameters. Further, individual posts were found in each case that violate predicted Kardar-Parisi-Zhang growth scaling limits. The technique's current iteration is comparable to existing techniques in speed: though data were studied from 10,756 individual objects, the majority could not be confidently used in subsequent analysis. Further refinement may allow high-throughput automated film characterization and permit close examination of subtle growth trends, potentially enhancing control over GLAD film broadening and morphology.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada; Security and Disruptive Technologies
Peer reviewedYes
IdentifierS1431927612001080
NPARC number21268843
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Record identifier0a1627c9-1fb4-4df0-929c-02b02de18fa1
Record created2013-11-14
Record modified2016-05-09
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