Single-etch grating coupler for micrometric silicon rib waveguides

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DOIResolve DOI: http://doi.org/10.1364/OL.36.002647
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TypeArticle
Journal titleOptics Letters
ISSN0146-9592
Volume36
Issue14
Pages26472649; # of pages: 3
Subject3 dB bandwidth; Additional costs; Bloch modes; Coupling efficiency; Device characterization; Excitation field; Fiber chip coupling; Grating couplers; Higher order; I-line steppers; Multimodes; Nanometrics; Rib waveguides; Silicon rib waveguides; Silicon wire waveguides; Silicon-on-insulators; Wafer-scale; Waveguide mode; Silicon wafers; Waveguides
AbstractGrating couplers are widely used as an efficient and versatile fiber-chip coupling structure in nanometric silicon wire waveguides. The implementation of efficient grating couplers in micrometric silicon-on-insulator (SOI) rib waveguides is, however, challenging, since the coupler waveguide region is multimode. Here we experimentally demonstrate grating couplers in 1:5 ?m-thick SOI rib waveguides with a coupling efficiency of ?2:2 dB and a 3 dB bandwidth of 40nm. An inverse taper is used to adiabatically transform the interconnection waveguide mode to the optimum grating coupler excitation field with negligible higher order Bloch mode excitation. Couplers are fabricated in the same etch step as the waveguides using i-line stepper lithography. The benefits of wafer-scale testing and device characterization without facet preparation are thus attained at no additional cost. © 2011 Optical Society of America.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); NRC Institute for Microstructural Sciences
Peer reviewedYes
NPARC number21271492
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Record identifier0d3a9249-5119-487c-8e41-4ad22c366e26
Record created2014-03-24
Record modified2016-05-09
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