Fabrication of nanoelectromechanical systems via the integration of high surface area glancing angle deposition thin films

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DOIResolve DOI: http://doi.org/10.1088/0960-1317/24/6/065021
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TypeArticle
Journal titleJournal of Micromechanics and Microengineering
ISSN0960-1317
Volume24
Issue6
Article number65021
Pages112
Subjectglancing angle deposition; nanoelectromechanical systems; thin films; nanofabrication
AbstractNanoelectromechanical systems (NEMS) coated with a high surface area thin film are fabricated. Glancing angle deposition (GLAD) is used to uniformly deposit high surface area, nanostructured SiO2 films on top of released NEMS. The resonance frequencies and quality factors are measured to assess the potential of the high surface area NEMS for sensing experiments. Resonance frequencies of coated cantilevers, although reduced by mass loading, can be predicted accurately using our derived model. Compressive stress makes the resonance frequencies of coated doubly-clamped beams difficult to predict. The quality factors of the coated NEMS are reduced by one order of magnitude by a quasi-continuous layer at the base of the GLAD film, which also introduces an estimated compressive stress of 5.3-9.3 MPa. The limit of detection is demonstrated to be ∼2 pg cm-2. With this successful proof-of-concept demonstration, we anticipate the future use of these devices as high surface area gravimetric mass sensors for applications such as gas chromatography.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); Security and Disruptive Technologies
Peer reviewedYes
NPARC number21273005
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Record identifier0de506a4-785e-44fe-82a8-a869c24bfbbc
Record created2014-12-05
Record modified2016-05-09
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