Fabrication of flexible superhydrophobic films by lift-up soft-lithography and decoration with Ag nanoparticles

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DOIResolve DOI: http://doi.org/10.1088/0957-4484/20/6/065304
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TypeArticle
Journal titleNanotechnology
Volume20
Issue6
Pages065304-1065304-6; # of pages: 6
SubjectSuperhydrophobic; soft-lithography; nanoparticles; surface of silica spheres; polydimethylsiloxane (PDMS); Scanning electron microscopy (SEM); elastomeric
AbstractSuperhydrophobic films with excellent flexibility have been fabricated by combining the lift-up soft-lithography technique and chemical reduction of [Ag(NH3)2]+ ions to Ag nanoparticles (NPs) on the surface of silica spheres which are patterned on the polydimethylsiloxane (PDMS) films. Scanning electron microscopy (SEM) images reveal the presence of raspberry-like hierarchical structures on the PDMS films. The influence of the amount of Ag NPs and the size of the silica spheres on the wettability of the soft films is investigated carefully. Because PDMS films are elastomeric materials, our superhydrophobic films offer great flexibility. The resulting films can be easily transferred from one substrate surface to another without destroying their superhydrophobicity. These flexible and superhydrophobic films can be used repeatedly to satisfy a wide range of applications.
Publication date
LanguageEnglish
AffiliationNRC Steacie Institute for Molecular Sciences; National Research Council Canada
Peer reviewedYes
NPARC number16474628
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Record identifier1bc08fc6-49da-44fe-9623-e0efb490f7f3
Record created2011-02-15
Record modified2016-05-09
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