Polarization control in silicon photonic waveguide components using cladding stress engineering

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DOIResolve DOI: http://doi.org/10.1007/978-3-642-10506-7_2
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TypeArticle
Journal titleTopics in Applied Physics
ISSN0303-4216
ISBN9783642105050
Volume119
Pages3170; # of pages: 40
AbstractThis chapter reviews the characteristics of SOI ridge waveguide birefringence, as governed by the waveguide cross-section geometry, the cladding stress level, and cladding thickness. Typical stress levels in dielectric cladding films such as silicon dioxide and silicon nitride are such that the stress-induced birefringence is of comparable magnitude to the waveguide geometrical birefringence. Therefore the total waveguide birefringence can be precisely controlled by counter-balancing these two factors. The application of this technique for achieving polarization independence in a variety of photonic components is described, as well as an example of polarization splitting. Passive and active tuning of the stress-induced birefringence is discussed. The use of birefringence tuning to enhance the efficiency in optical parametric processes and stress-induced Pockels electro-optic effect are also briefly addressed. © Springer-Verlag Berlin Heidelberg 2011.
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LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); NRC Institute for Microstructural Sciences (IMS-ISM)
Peer reviewedYes
NPARC number21271034
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Record identifier1c4ee7fd-bc59-40a9-9aaa-0c8b472e1f47
Record created2014-03-24
Record modified2016-05-09
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