Reversible passivation of silicon dangling bonds with the stable radical TEMPO

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DOIResolve DOI: http://doi.org/10.1021/nl034258
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TypeArticle
Journal titleNano letters
ISSN15306984
Volume3
Issue10
Pages14311435; # of pages: 5
AbstractTEMPO, 2,2,6,6-tetramethylpiperidinyloxy, was used to passivate dangling bonds on hydrogen-terminated Si(100) and Si(111) surfaces. TEMPO reacts with the dangling bond through a radical coupling reaction of the oxygen and silicon atoms. STM images reveal that the TEMPO-passivated Si is stable under typical imaging conditions and also protects the surface from reaction with styrene. TEMPO may also be desorbed from the surface by scanning at elevated voltages (greater than -3.5 V) and provides the ability to selectively remove TEMPO to prepare single dangling bonds on an otherwise passivated surface.
Publication date
AffiliationNational Research Council Canada; National Institute for Nanotechnology; NRC Institute for National Measurement Standards; NRC Institute for Microstructural Sciences
Peer reviewedNo
Identifier19345410
NPARC number12333584
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Record identifier1cf279dc-1d46-4c0e-8cfd-1e7f96aa6bf5
Record created2009-09-10
Record modified2016-05-09
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