Pattern Replication of 100 nm to Millimeter-Scale Features by Thermal Nanoimprint Lithography

Download
  1. (PDF, 316 KB)
  2. Get@NRC: Pattern Replication of 100 nm to Millimeter-Scale Features by Thermal Nanoimprint Lithography (Opens in a new window)
DOIResolve DOI: http://doi.org/10.1016/j.mee.2006.01.013
AuthorSearch for: ; Search for:
TypeArticle
Journal titleMicroelectronic Engineering
ISSN0167-9317
Volume83
Issue4-9
Pages902905; # of pages: 3
SubjectThermal nanoimprint lithography; Hot embossing; Pattern replication; Liftoff; Polymer viscosity
AbstractThe aim of this work is to demonstrate the ability of nanoimprint lithography (NIL) to replicate patterns having feature sizes ranging from nanoscale to millimeter scale. The pattern replication process includes NIL on PMMA, PMMA RIE, metal liftoff and then silicon RIE for final pattern transfer. A tri-layer resist scheme was employed to facilitate the liftoff. We studied systematically the dependence of the maximum duplicable feature size on imprint temperature, pressure and time, which shows good agreement with a simple squeeze flow model. The maximum duplicable feature size also depends on PMMA molecular weight and the amount of PMMA RIE. For example, with NIL at 200 C and 20 bar for 20 min and PMMA etching of 180 nm, we duplicated 1.3 mm square pattern without defects using 12 kg/mol PMMA. Such amount of PMMA RIE leads to the nanoscale grating line-width increase of 18 nm.
Publication date
PublisherElsevier Science Ltd.
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); NRC Industrial Materials Institute
Peer reviewedYes
NRC number48970
NPARC number15930972
Export citationExport as RIS
Report a correctionReport a correction
Record identifier209165b1-c7cb-4a4a-bf21-c12857f02e15
Record created2010-08-17
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)