Photooxidation of Hydrogen-Terminated Si(111) Surfaces Studied by Optical Second Harmonic Generation

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DOIResolve DOI: http://doi.org/10.1021/jp0344489
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TypeArticle
Journal titleThe journal of physical chemistry. B
ISSN15206106
Volume107
Issue35
Pages93889396; # of pages: 9
AbstractPhotooxidation of hydrogen-terminated Si(111) surfaces in air has been studied by using optical second harmonic generation (SHG) in reflection from the silicon surface. The mechanism of photooxidation induced by a mercury pen lamp is shown to involve oxygen atoms produced by 185-nm photodissociation of O2 in the gas phase above the Si(111)-H surface. Several fundamental wavelengths were used for SHG, including two-photon resonant excitations that are characteristic of H-terminated and oxidized Si(111) surfaces. By focusing on the anisotropic part of the SHG response, the specific response of intra-bilayer Si-Si bonds was isolated. A pronounced nonmonotonic variation of the SHG signal was observed during photooxidation and also during oxidation of Si(111)-H surfaces in air in the dark. A simple model is described that relates modulations in the SHG signal with progressive oxidation of distinct layers of Si-Si bonds near the surface. An analysis suggests that inter- as well as intra-bilayer bonds are attacked by oxygen atoms at an early stage during photooxidation.
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LanguageEnglish
AffiliationNational Research Council Canada; NRC Steacie Institute for Molecular Sciences
Peer reviewedYes
Identifier18077705
NPARC number12333654
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Record identifier21ed5c93-2702-4420-83e7-b68240992964
Record created2009-09-10
Record modified2017-03-23
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