Direct patterning, conformal coating, and erbium doping of luminescent nc-Si/SiO2 thin films from solution processable hydrogen silsesquioxane

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DOIResolve DOI: http://doi.org/10.1002/adma.200700731
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TypeArticle
Journal titleAdvanced Materials
Volume19
Issue21
Pages35133516; # of pages: 4
Subjectcoatings; doping; erbium; luminescence; nanocrystals, inorganic; patterning; silica; silicon
AbstractHydrogen silsesquioxane is used as a solution-borne molecular precursor in the fabrication of highly luminescent thin films of SiO2 containing silicon nanocrystals. Films are readily formed on non-flat substrates (e.g., optical fibers) and patterned using e-beam lithography (see figure).
Publication date
LanguageEnglish
AffiliationNational Research Council Canada; National Institute for Nanotechnology
Peer reviewedYes
NPARC number12330151
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Record identifier225de054-1e1c-44a4-a7a0-3fc5a4a2af03
Record created2009-09-10
Record modified2016-05-09
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