Gadolinium Silicate Gate Dielectric Films with Sub-1.5 nm Equivalent Oxide Thickness

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DOIResolve DOI: http://doi.org/10.1063/1.1356725
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TypeArticle
Journal titleApplied Physics Letters
Volume78
Issue12
Pages1718
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; NRC Institute for National Measurement Standards
Peer reviewedNo
NPARC number12744432
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Record identifier23cf2419-999e-4b8e-b9ae-1945a6df019b
Record created2009-10-27
Record modified2016-05-09
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