Fabricating nanostructures on fused silica using femtosecond infrared pulses combined with sub-nanojoule ultraviolet pulses

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DOIResolve DOI: http://doi.org/10.1364/OL.39.005638
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TypeArticle
Journal titleOptics Letters
ISSN0146-9592
Volume39
Issue19
Pages56385640; # of pages: 3
SubjectFemtoseconds; Infrared pulse; Ultraviolet pulse
AbstractCircular craters with diameters of 500 nm are fabricated on the surface of fused silica by femtosecond ultraviolet-infrared (UV-IR) pulse trains with 0.8 nJ UV pulse energy. UV damage thresholds at different IR energies and UV-IR delays are measured. Diameters and depths of the ablated craters can be modified by adding the IR pulse and varying the UV-IR delays. These results demonstrate the feasibility of nanomachining using short wavelength lasers with pulse energy far below normal damage thresholds.
Publication date
PublisherOSA Publishing
LanguageEnglish
AffiliationSecurity and Disruptive Technologies; National Research Council Canada
Peer reviewedYes
NPARC number21272776
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Record identifier2cdfb7ed-d25a-4fcf-a92a-0a0ce6c24970
Record created2014-12-03
Record modified2016-05-09
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