Focused ion beam lithography of multiperiod gratings for a wavelength-division-multiplexed transmitter laser array

Download
  1. Get@NRC: Focused ion beam lithography of multiperiod gratings for a wavelength-division-multiplexed transmitter laser array (Opens in a new window)
DOIResolve DOI: http://doi.org/10.1116/1.588252
AuthorSearch for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for:
TypeArticle
Journal titleJournal of Vacuum Science Technology B
Volume13
Issue6
Pages27222724; # of pages: 3
AbstractWavelength-division multiplexing with closely spaced multiple wavelengths is of great interest for high-capacity data transmission. One major and very critical requirement of such a system is the fabrication of a laser array with very small wavelength separations (∼2 nm). In this paper, the design, fabrication, and performance of an integrated eight-channel system is described. Focused ion beam lithography, with the beam deflection sensitivity modified from its calibrated value, is used to write the critical stepped-period distributed-Bragg-reflector gratings required to provide the tightly controlled multiple laser frequencies. The outputs of the lasers are combined via curved waveguides into a single optical output.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12339242
Export citationExport as RIS
Report a correctionReport a correction
Record identifier2e5d7c15-2af3-4b08-beaf-bb4253f83911
Record created2009-09-11
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)