Single etch fibre-to-chip grating couplers for high-volume production in SOI

DOIResolve DOI: http://doi.org/10.1109/ICO-IP.2011.5953786
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TypeArticle
Proceedings title2011 ICO International Conference on Information Photonics, IP 2011
Conference2011 ICO International Conference on Information Photonics, IP 2011, 18 May 2011 through 20 May 2011, Ottawa, ON
ISBN9781612843155
Article number5953786
SubjectDUV lithography; Effective media; Effective medium; Grating couplers; High-volume production; Single etch; Sub-wave length grating; Sub-wavelength structures; Photonics
AbstractFibre-to-chip grating couplers are an efficient means for injecting and extracting light from silicon-wire waveguides. Here we present the design of single-etch couplers, based on effective media implemented with sub-wavelength gratings. We show that the pitch of these sub-wavelength structures can be increased to make their fabrication compatible with deep-ultraviolet lithography, without compromising their effective medium behavior. We experimentally demonstrate fully-etched grating couplers fabricated with DUV lithography. © 2011 IEEE.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); NRC Institute for Microstructural Sciences
Peer reviewedYes
NPARC number21271564
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Record identifier2fe57029-43c7-4cc9-9466-7324d8ff0df1
Record created2014-03-24
Record modified2016-05-09
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