Fabrication of Parallel Quantum Point Contacts with Submicron Airbridges

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DOIResolve DOI: http://doi.org/10.1116/1.582256
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TypeArticle
Journal titleJournal of Vacuum Science and Technology A
Volume18
Issue2
Pages730733; # of pages: 4
AbstractAn airbridge technique was developed and subsequently employed to fabricate mesoscopic devices, such as parallel quantum point contacts. The airbridge technique mainly involves two different electron sensitive polymers, polymethylglutarimide and polymethyl methacrylate. The airbridge was patterned by electron beam lithography and metal lift-off with bilayer resist. Conductance measurements were performed on the devices at low magnetic fields. The results confirmed both the presence of the elliptical antidot as a negative voltage was applied to the center gate, as well as the nonintrusive nature of the airbridge technique.
Publication date
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12744200
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Record identifier324f578e-36c0-4fbd-bd45-0cc90a6ed42e
Record created2009-10-27
Record modified2016-05-09
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