Ultrathin-layer chromatography nanostructures modified by atomic layer deposition

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DOIResolve DOI: http://doi.org/10.1016/j.chroma.2013.05.050
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TypeArticle
Journal titleJournal of Chromatography A
ISSN0021-9673
Volume1299
Pages118125; # of pages: 8
SubjectThin layer chromatography (TLC); Ultrathin-layer chromatography (UTLC); Glancing angle deposition (GLAD); Atomic layer deposition (ALD); Nanostructured thin films; Surface functionalization
AbstractStationary phase morphology and surface chemistry dictate the properties of ultrathin-layer chromatography (UTLC) media and interactions with analytes in sample mixtures. In this paper, we combined two powerful thin film deposition techniques to create composite chromatography nanomaterials. Glancing angle deposition (GLAD) produces high surface area columnar microstructures with aligned macropores well-suited for UTLC. Atomic layer deposition (ALD) enables precise fabrication of conformal, nanometer-scale coatings that can tune surfaces of these UTLC films. We coated ~5μm thick GLAD SiO2 UTLC media with <10nm thick ALD metal oxides (Al2O3, ZrO2, and ZnO) to decouple surface chemistry from the underlying GLAD scaffold microstructure. The effects of ALD coatings on GLAD UTLC media were investigated using transmission electron microscopy (TEM), gas adsorption porosimetry, and lipophilic dye separations. The results collectively show that the most significant changes occur over the first few nanometers of ALD coating. They further demonstrate independent control of film microstructure and surface characteristics. ALD coatings can enhance complex GLAD microstructures to engineer new composite nanomaterials potentially useful in analytical chromatography. © 2013 Elsevier B.V..
Publication date
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); Security and Disruptive Technologies
Peer reviewedYes
NPARC number21271809
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Record identifier34a0ceb3-15a9-4c32-988a-dd1b5cd46abc
Record created2014-04-22
Record modified2016-05-09
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