High resolution study of photo-induced modification in fused silica produced by a tightly focused femtosecond laser beam in the presence of aberrations

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DOIResolve DOI: http://doi.org/10.1063/1.1944223
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TypeArticle
Journal titleJournal Of Applied Physics
Volume98
Issue1
Pages013517–; # of pages: 1
AbstractAn ultrahigh-resolution (20 nm) technique of selective chemical etching and atomic force microscopy has been used to study the photoinduced modification in fused silica produced at various depths by tightly focused femtosecond laser radiation affected by spherical aberration. We demonstrate that shapes of the irradiated zones near the threshold for modification can be predicted by taking proper account of spherical aberration caused by the refractive index mismatched air–silica interface. We establish a depth dependence of the pulse energy required to initiate modification and characterize the relationship between numerical aperture of the writing lens and practically achievable writing depth. We also show that spatial characteristics of the laser-modified zones can be controlled by a specially designed focusing system which allows correction for a variable amount of spherical aberration.
Publication date
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences; NRC Steacie Institute for Molecular Sciences
Peer reviewedNo
NPARC number12339209
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Record identifier352fe16f-512f-4098-bbf4-081b98d7d55f
Record created2009-09-11
Record modified2016-05-09
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