An interferometer for thin film measurement

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TypeTechnical Report
Series titleERB; no. ERB-779
Physical description17 p.
Subjectfilm; interferometer
AbstractThe multiple-beam interferometer described here is intended to measure the thickness of evaporated films whose thickness is in the order of 1000 A. The accuracy of these measurements is ± 2%. The multiple-beam principle is outlined followed by a consideration of the design steps including choice of air wedge angle and thickness, microscope objective, degree of collimation. The completed interferometer is described with proposed improvements.
Publication date
PublisherNational Research Council of Canada, Radio and Electrical Engineering Division
AffiliationNational Research Council Canada
Peer reviewedNo
NPARC number21274737
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Record identifier36b98901-05f8-4f3c-9527-fa8dca25270e
Record created2015-03-31
Record modified2016-10-03
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