Single etch grating couplers for mass fabrication with DUV lithography

Download
  1. Get@NRC: Single etch grating couplers for mass fabrication with DUV lithography (Opens in a new window)
DOIResolve DOI: http://doi.org/10.1007/s11082-012-9563-2
AuthorSearch for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for:
TypeArticle
Journal titleOptical and Quantum Electronics
ISSN0306-8919
1572-817X
Volume44
Issue12-13
Pages521526; # of pages: 6
Subjectfiber-to-chip grating coupler; deep ultraviolet lithography; single etch process
AbstractSurface grating couplers enable efficient coupling of light between optical fibers and planar waveguide circuits. While traditional grating designs require two etch steps for efficient coupling to silicon-on-insulator waveguides, recently proposed subwavelength structured gratings can achieve the same coupling efficiencies with a single etch step, thereby significantly reducing fabrication complexity. Here we demonstrate that such couplers can be fabricated on a large scale with ultra-violet lithography, achieving a 5 dB coupling efficiency at 1,550 nm. Through both simulations and experiments we give physical insight on how pattern fidelity impacts the performance of these couplers, and propose strategies to deal with inevitable process variations.
Publication date
LanguageEnglish
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedYes
Identifier9563
NPARC number21268395
Export citationExport as RIS
Report a correctionReport a correction
Record identifier3ae6e66a-103d-4df0-8445-37629981b59d
Record created2013-07-10
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)