Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs

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DOIResolve DOI: http://doi.org/10.1117/12.2182633
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TypeArticle
Proceedings titleProceedings of SPIE: The International Society for Optical Engineering
ConferenceDamage to VUV, EUV, and X-Ray Optics V, 15 April 2015 through 16 April 2015
ISSN0277-786X
ISBN9781628416329
Volume9511
Article number95110C
SubjectElectromagnetic pulse; Fused silica; Ionization; Laser pulses; Multiphoton processes; Photoionization; Time delay; Ultrafast lasers; Ultrashort pulses; X ray optics; Avalanche ionization; Damage formation; Femtosecond laser machining; Multi-photon absorption; Multiphoton ionization; Pulse durations; Rate-equation models; UV pulse; Pulse generators
AbstractWe investigate damage formation on the surface of fused silica by two femtosecond laser pulses, a tightly focused 266 nm (UV) pulse followed by a loosely focused 800 nm (IR) pulse. We show that the damage size is determined by the UV pulse, and only a small fraction of the normal UV damage threshold energy is needed to cause damage when combined with the properly delayed IR pulse. Our results, analyzed with a rate equation model, suggest that the UV pulse generates seed electrons through multiphoton absorption and the IR pulse utilizes these electrons to cause damage by avalanche ionization. By tuning such parameters like pulse energy, time delay, IR pulse duration and polarization, we further demonstrate that damage profile can be controlled.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada; Security and Disruptive Technologies
Peer reviewedYes
NPARC number21276938
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Record identifier3da4efff-3cef-4511-a9d1-b992f7bc0083
Record created2015-11-10
Record modified2016-05-09
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