Suppression of interfacial reaction for HfO2 on Silicon by pre-CF4 plasma treatment

Download
  1. Get@NRC: Suppression of interfacial reaction for HfO2 on Silicon by pre-CF4 plasma treatment (Opens in a new window)
DOIResolve DOI: http://doi.org/10.1063/1.2337002
AuthorSearch for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for:
TypeArticle
Journal titleApplied Physics Letters
Volume89
Issue7
Pages072904
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; NRC Institute for National Measurement Standards
Peer reviewedNo
NPARC number12744450
Export citationExport as RIS
Report a correctionReport a correction
Record identifier406ce93d-78db-4e58-8fa5-b2b9b0387d0d
Record created2009-10-27
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)