Surface cleaning and preparation in AlGaN/GaN-based HEMT processing as assessed by X-ray photoelectron spectroscopy

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DOIResolve DOI: http://doi.org/10.1016/j.apsusc.2007.01.016
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TypeArticle
Journal titleApplied Surface Science
Volume253
Issue14
Pages6185–6190
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedNo
NPARC number12744268
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Record identifier4639c7b3-057d-4307-b85c-cb87bf463e10
Record created2009-10-27
Record modified2016-05-09
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