Exposure characteristics of cobalt fluoride (CoF2) self-developing electron-beam resist on sub-100 nm scale

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DOIResolve DOI: http://doi.org/10.1063/1.1487914
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TypeArticle
Journal titleJournal of Applied Physics
Volume92
Issue2
Pages11121121; # of pages: 10
Subjectcobalt compounds; electron energy loss spectra; electron resists; nanostructured materials; transmission electron microscopy
AbstractWe have studied electron-beam exposure of cobalt fluoride (CoF2) thin films by real-time high-resolution transmission electron microscopy and by electron energy-loss spectroscopy. We were able to remove fluorine completely from an irradiated area and retain metallic cobalt by exposing the area at low dose rate and elevated temperature. The structures were composed of separated single-crystal cobalt nanoparticles with dimensions on the order of 5�10 nm.
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LanguageEnglish
Peer reviewedYes
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This is a non-NRC publication

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NPARC number12328545
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Record identifier4abdb180-f750-4d41-a458-37f856e2e1d2
Record created2009-09-10
Record modified2016-05-09
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