Metal oxide morphology in argon-assisted glancing angle deposition

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Journal titleJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Article number21507
SubjectArgon flux; Beam geometry; Birefringent thin films; Columnar architectures; Deposition process; Film density; Film materials; Glancing Angle Deposition; Metal oxides; Nanoscale films; Thin-film deposition technique; Tilt angle; Vapor fluxes; Metallic compounds; Photonic crystals; Specific surface area; Morphology
AbstractGlancing angle deposition (GLAD) is a thin film deposition technique capable of fabricating columnar architectures such as posts, helices, and chevrons with control over nanoscale film features. Argon bombardment during deposition modifies the GLAD process, producing films with new morphologies which have shown promise for sensing and photonic devices. The authors report modification of column tilt angle, film density, and specific surface area for 12 different metal oxide and fluoride film materials deposited using Ar-assisted GLAD. For the vapor flux/ion beam geometry and materials studied here, with increasing argon flux, the column tilt increases, film density increases, and specific surface area decreases. With a better understanding of the nature of property modification and the mechanisms responsible, the Ar-assisted deposition process can be more effectively targeted towards specific applications, including birefringent thin films or photonic crystal square spirals. © 2012 American Vacuum Society.
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AffiliationNational Research Council Canada (NRC-CNRC); National Institute for Nanotechnology
Peer reviewedYes
NPARC number21270232
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Record identifier4ee0f305-ea98-493a-af2c-b28a345f33a5
Record created2014-01-14
Record modified2016-05-09
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