Pulsed laser deposition of vanadium-doped manganese oxide thin films for supercapacitor applications

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DOIResolve DOI: http://doi.org/10.1016/j.jpowsour.2012.11.067
AuthorSearch for:
TypeArticle
Journal titleJournal of Power Sources
ISSN0378-7753
Volume228
Pages8996; # of pages: 8
SubjectElectrochemical capacitor; Supercapacitor; Pulsed laser deposition; Vanadium doping; Manganese oxides; Thin films
AbstractThin films of vanadium-doped crystalline Mn2O3 and amorphous MnOx have been grown by the pulsed laser deposition (PLD) process on silicon wafer and stainless steel substrates at different substrate temperatures and oxygen gas pressures. It was found that V-doping level as low as 3.2 atm. % can transform the crystal structure of a crystalline Mn 2O3 film into a crystalline MnO2 film. V-doping (up to 10 atm. %) has significantly lowered the specific capacitance of the crystalline Mn2O3 films. However, V-doped amorphous MnOx films did significantly increase the specific capacitance at high CV scan rate as compared with the un-doped MnOx films and the specific capacitance of V-doped amorphous films increased linearly with the V atomic percentage. At high scan rate of 100 mV s-¹, 9.7 atm. % V-doped MnOx film reached a high specific capacitance value of 95 F g-#185; indicating that V-doped amorphous MnOx is good candidate active materials for high energy supercapacitors. The results prove that elemental doping can significantly change the electrochemical properties of MnOx films.
Publication date
LanguageEnglish
AffiliationAutomotive and Surface Transportation; National Research Council Canada
Peer reviewedYes
NPARC number21270515
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Record identifier51954392-ddc2-41af-b7ff-d3213152295d
Record created2014-02-14
Record modified2016-05-09
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