Design of an optimized grating coupler for thick SOI rib waveguides

DOIResolve DOI: http://doi.org/10.1109/ICO-IP.2011.5953789
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TypeArticle
Proceedings title2011 ICO International Conference on Information Photonics, IP 2011
Conference2011 ICO International Conference on Information Photonics, IP 2011, 18 May 2011 through 20 May 2011, Ottawa, ON
ISBN9781612843155
Article number5953789
SubjectChip coupling; Coupling efficiency; Grating couplers; Higher-order modes; I-line steppers; Optimized designs; Rib waveguides; Si wire waveguide; Silicon layer; Single etch; Thick SOI; Wafer scale; Optimization; Photonics; Silicon wafers; Waveguides
AbstractThe use of grating couplers for fiber to chip coupling is a promising technique, allowing wafer scale testing with no need for facet preparation. Albeit grating couplers have been extensively studied for Si-wire waveguides, the implementation on SOI micrometric rib waveguides remains challenging, mainly due to excitation of higher order modes. In this work we show for the first time that monomode excitation of the grating can be achieved by properly designing the access waveguide. With the proposed approach the circuit can be fabricated using standard i-line stepper litography with a single etch step. The optimized design for a 1.5m thick silicon layer achieves a simulated coupling efficiency of 65.6% at 1.55m. Preliminary experimental results yield a coupler loss of 4dB. © 2011 IEEE.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); NRC Institute for Microstructural Sciences
Peer reviewedYes
NPARC number21271481
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Record identifier532e168c-efc6-49e5-8c31-035008236f64
Record created2014-03-24
Record modified2016-05-09
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