Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol

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DOIResolve DOI: http://doi.org/10.1149/1.3137053
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TypeArticle
Journal titleJournal of The Electrochemical Society
Volume156
Issue8
PagesG89G96
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedNo
NPARC number12441141
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Record identifier5eecfa14-2819-431f-8c40-ddd7791d189a
Record created2009-09-25
Record modified2016-05-09
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