Relaxation in tensile-strained InAlSb/InSb heterostructures

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Journal titleJournal of Applied Physics
Pages14661470; # of pages: 5
Subjectaluminium antimonides; heterostructures; indium antimonides; lattice parameters; relaxation; sputtered materials; strains; tensile properties; ternary compounds; XRD
AbstractX-ray diffraction has been used to measure the residual strain in In1?xAlxSb (x=0.15�0.64) layers of thickness h=0.1 �m, grown epitaxially on (100) InSb substrates. The results for this tensile-strained system are compared with a well-studied compressive-strain system, viz., InGaAs/GaAs. Experimental evidence is presented which suggests that the strain relaxation mechanism in this system is different from that in InGaAs/GaAs. This includes an observed critical layer thickness (hc) which is about five times the hc given by the Matthews and Blakeslee [J. Cryst. Growth 27, 118 (1974)] type models and a measured relaxation coefficient which is quasilinear in h/hc for 5<h/hc<35. The results have also been compared with predictions of the Dodson�Tsao (DT) model [Appl. Phys. Lett. 51, 1710 (1987)] which fits well the quasilinear behavior of the relaxation coefficient. In addition, it is argued that the DT equation provides a generic model that is not restricted to dislocation-mediated strain relief. Other possible mechanisms of strain relaxation in InAlSb/InSb are discussed.
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AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12326998
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Record identifier60eedf54-b055-4d80-b72e-c756bc9a2ffe
Record created2009-09-10
Record modified2016-05-09
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