Surface photochemistry: generation of benzyl radical pairs on dry silica gel

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DOIResolve DOI: http://doi.org/10.1139/v84-071
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TypeArticle
Journal titleCanadian Journal of Chemistry
Volume62
Issue3
Pages403410; # of pages: 8
AbstractSinglet and triplet benzyl radical pairs have been generated on silica gel by photolysis of a benzyl phenylacetate, a dibenzyl ketone, and a dibenzyl sulfone. The extent of geminate radical recombination has been measured and requires that translational motion of radicals occur on the silica gel surface. This motion was affected by the radical pair multiplicity and the photolysis temperature, but was relatively insensitive to the state of hydration of the silica gel and the presence of coadsorbates. The presence of certain rearranged starting materials, which are not formed in solution, amongst the products from photolysis of both dibenzyl ketone and dibenzyl sulfone on silica gel indicates the restrictions on radical movement on the surface on the shorter timescale of the benzyl�phenylacetyl and benzyl � benzyl sulfonyl radical pairs.
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AffiliationNational Research Council Canada; NRC Steacie Institute for Molecular Sciences
Peer reviewedNo
NPARC number12337986
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Record identifier61829851-3dee-4a9e-a91b-6372b7f81e9f
Record created2009-09-10
Record modified2016-05-09
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