Adhesion Evaluation of Plasma-Deposited Si3N4 and SiO2 Thin Films on Si by the Scratch Method

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TypeOther
PlaceVancouver
AffiliationNRC Institute for Aerospace Research; National Research Council Canada; NRC Institute for Research in Construction
Access conditionunclassified/unlimited
Peer reviewedNo
NRC numberSMPL-1995-0058
NPARC number8929198
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Record identifier637a1218-0a45-466e-8fbb-f1f8632f5ca5
Record created2009-04-23
Record modified2016-05-09
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