Fabrication of a variable diffraction efficiency phase mask by multiple dose ion implantation

DOIResolve DOI: http://doi.org/10.1116/1.588283
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TypeArticle
Proceedings titlePapers from the 39th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Series titleJournal of Vacuum Science and Technology B, Microelectronics processing and phenomena; Volume 13
ConferenceThe 39th International symposium on electron, ion, and photon beams, Scottsdale, Arizona, USA, May 30 - June 2, 1995
ISBN1563965399
Pages29402943; # of pages: 4
SubjectBRAGG REFLECTION; DIFFRACTION GRATINGS; FIBER OPTICS; ION IMPLANTATION; MASKING; RADIATION DOSES; SILICON IONS; SILICON OXIDES
AbstractApodized fiber Bragg gratings show reductions in the unwanted sidebands from those of uniform Bragg grating. A phase mask whose diffraction efficiency varied from the center to the ends was fabricated by implanting a grating pattern in a SiO2 substrate with Si + + and wet etching in diluted HF. The phase mask diffraction efficiency vs ion dose was measured. Using this phase mask, apodized Bragg gratings were photoimprinted into fibers. The sidebands of the apodized fiber gratings were 26 dB below the peak of the central resonance compared to 12 dB for the uniform Bragg grating. The modeled values were 29 and 13.2 dB, respectively.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12339096
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Record identifier66cc1517-32cb-41fd-b50d-3868155b7408
Record created2009-09-11
Record modified2016-05-09
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