Formation and reactivity of high quality halogen terminated Si(1 1 1) surfaces

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DOIResolve DOI: http://doi.org/10.1016/j.susc.2005.02.006
AuthorSearch for: ; Search for:
TypeArticle
Journal titleSurface Science
Volume579
Issue2-3
Pages8996; # of pages: 8
SubjectBromine; Chlorine; Electron energy loss; Oxidation; Scanning tunneling microscopy; Silicon; Surface chemistry; Water
AbstractHigh quality halogenated silicon surfaces have been produced using gas phase reactions of H-terminated Si(1?1?1) with molecular chlorine or bromine at room temperature. STM images show that the resulting surfaces maintain the low defect densities of H/Si(1?1?1). High resolution electron energy loss spectra confirm halogenation of the surface through the observation of the Si-Cl or Si-Br stretch modes and also indicate the absence of significant oxidation or contamination of the surface even after brief air exposure. While chlorine terminated surfaces are found to be surprisingly stable to exposure to water vapour, dipping in water destroys the surface by insertion of oxygen into silicon backbonds and formation of terminal H and O-H groups. In lab air, oxidation is observed to proceed rather slowly and in a patch-like fashion with substantial chlorine still present after >10?h exposure.
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AffiliationNational Research Council Canada; NRC Institute for National Measurement Standards; NRC Steacie Institute for Molecular Sciences
Peer reviewedNo
NPARC number12327032
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Record identifier6e93de1e-e1b8-425f-9bc3-586aba8ec878
Record created2009-09-10
Record modified2016-05-09
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