Fabrication of microchannels in glass using focused femtosecond laser radiation and selective chemical etching

Download
  1. Get@NRC: Fabrication of microchannels in glass using focused femtosecond laser radiation and selective chemical etching (Opens in a new window)
DOIResolve DOI: http://doi.org/10.1007/s00339-006-3590-4
AuthorSearch for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for:
TypeArticle
Journal titleApplied physics A. Materials Science and Processing
Volume84
Issue1-2
Pages4761; # of pages: 15
AbstractWe use the combination of femtosecond laser dielectric modification and selective chemical etching to fabricate high-quality microchannels in glass. The photoinduced modification morphology has been studied in fused silica and in borosilicate glass BK7, using ultra-high spatial resolution techniques of selective chemical etching followed by atomic force or scanning electron microscopy. The analysis shows that the high differential etch rate inside the modified regions, is determined by the presence of polarization-dependent self-ordered periodic nanocracks or nanoporous structures. We also investigate the optimum irradiation conditions needed to produce high-aspect ratio microchannels with small symmetric cross-sections and smooth walls.
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; NRC Steacie Institute for Molecular Sciences
Peer reviewedYes
NPARC number12330048
Export citationExport as RIS
Report a correctionReport a correction
Record identifier6ff98159-546e-4b20-9bb7-3d6bb0d92c85
Record created2009-09-10
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)