The penetration depth of chemical reactions in a thin-film Co 3O4 supercapacitor electrode

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DOIResolve DOI: http://doi.org/10.1149/2.081405jes
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TypeArticle
Journal titleJournal of the Electrochemical Society
ISSN0013-4651
Volume161
Issue5
PagesA798A802
SubjectElectrodes; Electrolytic capacitors; Active Layer; Applied potentials; Chemical change; Exposed to; KOH solution; Pure water; Supercapacitor electrodes; Thickness of the film; Cobalt
AbstractAn experiment designed to measure the thickness of an electrochemically active layer on the surface of a thin-film Co3O4 electrode shows that the entire thickness of the film, 40 nm in all, undergoes chemical changes. This was the case when the film was first exposed to pure water and later subjected to +1 VSCE in 0.01M KOH solution. Upon removal of the applied potential, the film reverted to a state that was nearly identical to the one it had before polarization.
Publication date
PublisherThe Electrochemical Society
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); National Institute for Nanotechnology
Peer reviewedYes
NPARC number21272709
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Record identifier7c4665ec-37a3-421d-8634-cc1af230b8df
Record created2014-12-03
Record modified2016-05-09
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