Low temperature plasma etching for Si3N4 waveguide applications

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DOIResolve DOI: http://doi.org/10.1116/1.2836424
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TypeArticle
Journal titleJournal of Vacuum Science & Technology A
Volume26
Issue2
Pages259258; # of pages: 2
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedNo
NPARC number12744647
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Record identifier800aa0a3-663d-4393-af30-2aabd23dcfa8
Record created2009-10-27
Record modified2016-05-09
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