Process windows of nickel and platinum silicides in deep sub-micron regime

AuthorSearch for: ; Search for: ; Search for: ; Search for: ; Search for:
TypeArticle
Proceedings titleSilicide thin films : fabrication, properties, and applications : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A.
Series titleMaterials Research Society symposia proceedings; Volume 402
Conference1995 MRS Fall Meeting: Silicide Thin Films: Fabrication, Properties, and Applications Symposium, Boston, Massachusetts, November 27-30, 1995
ISBN1558993053
Pages5964; # of pages: 5
Publication date
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12330138
Export citationExport as RIS
Report a correctionReport a correction
Record identifier83b22300-01c0-4c84-ba49-607465a6cce4
Record created2009-09-10
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)