Photosensitivity and application with 157nm F2 laser radiation in planar lightwave circuits

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DOIResolve DOI: http://doi.org/10.1109/JLT.2002.802227
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TypeArticle
Journal titleJournal of Lightwave Technology
Volume21
Issue1
Pages140148; # of pages: 9
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedNo
NPARC number12744607
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Record identifier8535aad8-f32b-45c6-a838-9bf75cf10fb3
Record created2009-10-27
Record modified2016-05-09
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