Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films

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DOIResolve DOI: http://doi.org/10.1063/1.1583148
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TypeArticle
Journal titleJournal of Applied Physics
Volume94
Issue2
Pages1243
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedNo
NPARC number12744041
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Record identifier85361e9f-8097-4ad8-aca3-eb0f57ba2ae6
Record created2009-10-27
Record modified2016-05-09
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