Sub-Micrometer Patterning Using Soft Lithography

  1. (PDF, 1 MB)
DOIResolve DOI:
AuthorSearch for:
TypeBook Chapter
Book titleComprehensive Nanoscience and Technology
Pages6381; # of pages: 18
Subjectsoft lithography; patterning; nanostructure; PDMS; molding; printing; edge effects
AbstractThis chapter reviews the current state of soft lithography with a particular emphasis on the patterning of structures having lateral dimensions of below 1 ?m. Soft lithography is generally perceived as an ensemble of techniques that collectively employ elastomeric polymers – mostly based on poly(dimethylsiloxane) (PDMS) – in the form of a mold, stamp or mask as the central element of a pattern-forming process. The virtue of these techniques is rapid prototyping during which the structural information from either of these elements is translated into multiple copies of a functional material. This chapter comprises a set of dedicated sections that outline principal patterning strategies, and highlight relatively recent developments in research which are illustrated with selected examples from the open literature.
Publication date
AffiliationNRC Industrial Materials Institute; National Research Council Canada
Peer reviewedYes
NRC number52468
NPARC number16907850
Export citationExport as RIS
Report a correctionReport a correction
Record identifier86b1b373-e296-48ba-903a-7fdf463ab187
Record created2011-03-07
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)