A New KOH-Based UV Assisted Wet Etching Technique and Its Alication to AlGaN/GaN HFET Fabrication and Characterization

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TypeArticle
Proceedings titleIPAP Conf Series
ConferenceInt Workshop on Nitride Semiconductors, 2000
Pages965968; # of pages: 4
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; NRC Steacie Institute for Molecular Sciences
Peer reviewedNo
NPARC number12346331
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Record identifier8a31afe4-6bdf-45ec-a2a5-8d9404c06f93
Record created2009-09-17
Record modified2016-05-09
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