Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures

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DOIResolve DOI: http://doi.org/10.1364/OE.11.000775
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TypeArticle
Journal titleOptics Express
Volume11
Issue7
Pages775781; # of pages: 7
AbstractThe combination of selective chemical etching and atomic force microscopy has been used for the first time to make ultra-high spatial resolution (20 nm) index of refraction profiles of femtosecond laser modified structures in silica glass.
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; NRC Steacie Institute for Molecular Sciences
Peer reviewedYes
NPARC number12330181
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Record identifier8aef6a57-3ab1-437b-9ff3-e6d299007468
Record created2009-09-10
Record modified2016-05-09
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