Comparison of Ion Implantation Aroaches in the Fabrication of AlGaN/GaN HFETs: Classical vs Through the Gate Metal

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TypeArticle
ConferenceIPAP Conference Series 1, 2000, Tokyo
Volume931
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; NRC Steacie Institute for Molecular Sciences
Peer reviewedNo
NPARC number5212406
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Record identifier8c5fb574-c501-447c-8880-fa21421e2fd8
Record created2008-12-02
Record modified2016-05-09
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