Impact of bias voltage on furnace atomization plasma emission spectrometry performance

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DOIResolve DOI: http://doi.org/10.1016/0584-8547(93)80092-9
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TypeArticle
Journal titleSpectrochimica Acta Part B: Atomic Spectroscopy
ISSN05848547
Volume48
IssueMay/June
Pages893908; # of pages: 16
AbstractThe effects of an applied d.c. bias potential on the analytical response from a furnace atomization plasma emission spectrometry (FAPES) source operating with a 50 W He plasma were investigated. Enhancements in absolute sensitivity and detection limits for B, Cd, Pb, Ni, Fe, S, Pt and Se ranged from 2–10-fold as compared to the usual “free running” self-bias situation and response from all species was enhanced as the applied bias was made more negative. Reflected power increases up to 35 W exert little effect on the excitation conditions within the plasma. The excitation temperature of the He support gas as well as that of Fe introduced as a thermometric species indicated that, while the temperature of the former varied by up to 700 K over the course of an atomization transient, that of Fe remained relatively stable. Bias control reduced the fluctuation in the He temperature to under 400 K.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada
Peer reviewedNo
Identifier10274169
NRC number1237
NPARC number8896886
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Record identifier8ee88ff9-e506-4454-a065-1f854cd8f24d
Record created2009-04-22
Record modified2016-05-09
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