Basic questions related to electron-induced sputtering in the TEM

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Proceedings titleUltramicroscopy
ConferenceInternational Workshop on Enhanced Data Generated by Electrons : EDGE 2009, 17-22 May, 2009, Banff, Alberta, Canada
Pages991997; # of pages: 7
SubjectTEM; radiation damage; sputtering; knock-on displacement
AbstractAlthough the theory of high-angle elastic scattering of fast electrons is well developed, accurate calculation of the incident-energy threshold and cross section for surface-atom sputtering is hampered by uncertainties in the value of the surface-displacement energy Ed and its angular dependence. We show that reasonable agreement with experiment is achieved by assuming a non-spherical escape potential with Ed=(5/3) Esub, where Esub is the sublimation energy. Since field-emission sources and aberration-corrected TEM lenses have become more widespread, sputtering has begun to impose a practical limit to the spatial resolution of microanalysis for some specimens. Sputtering can be delayed by coating the specimen with a thin layer of carbon, or prevented by reducing the incident energy; 60 keV should be sufficiently low for most materials.
Publication date
AffiliationNational Institute for Nanotechnology; National Research Council Canada
Peer reviewedYes
NPARC number19734713
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Record identifier901c7966-0730-43ee-a9bd-cf9a6b567aa3
Record created2012-03-30
Record modified2016-05-09
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