Dopant depth profiling by anodic sectioning using 0.1 M HCl electrolyte

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DOIResolve DOI: http://doi.org/10.1149/1.1837225
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TypeArticle
Journal titleJournal Of The Electrochemical Society
Volume143
Issue11
PagesL256L258
Subjectdoping profiles; electrochemistry; electrolytes; impurity distribution; oxidation; silicon
AbstractA new procedure for dopant depth profiling by anodic sectioning is presented. It consists of using anodic oxidation in aqueous 0.1 M HCl solution at constant potential and offers several advantages over the previously used procedures for accomplishing the anodic sectioning. Constant voltage oxidation is insensitive to the sample size, and is highly uniform and very rapid. Removing the electrolyte from the sample is easy. The amount of Si removed per cycle can be determined accurately and is much less than in the traditional technique, indicating that the new procedure is more suitable for ultrashallow implants.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12338971
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Record identifier953349f6-f53a-4867-a42f-ca970950c273
Record created2009-09-11
Record modified2016-05-09
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