Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance

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DOIResolve DOI: http://doi.org/10.1039/c3ta12964k
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TypeArticle
Journal titleJournal of Materials Chemistry A
ISSN2050-7488
Volume1
Issue41
Pages1285012861; # of pages: 12
SubjectCoulombic efficiency; Electrochemical cycling; Focused ion beam analysis; High-rate capacities; Lithium-ion battery; Lithium-ion battery anodes; Nanowire assemblies; Solid electrolyte interphase; Anodes; Coatings; Electron energy loss spectroscopy; Lithium batteries; Nanowires; Photoelectrons; Silicon; Solid electrolytes; Titanium nitride; X ray photoelectron spectroscopy; Atomic layer deposition
AbstractWe demonstrate that nanometer-scale TiN coatings deposited by atomic layer deposition (ALD), and to a lesser extent by magnetron sputtering, will significantly improve the electrochemical cycling performance of silicon nanowire lithium-ion battery (LIB) anodes. A 5 nm thick ALD coating resulted in optimum cycling capacity retention (55% vs. 30% for the bare nanowire baseline, after 100 cycles) and coulombic efficiency (98% vs. 95%, at 50 cycles), also more than doubling the high rate capacity retention (e.g. 740 mA h g-¹ vs. 330 mA h g-¹, at 5 C). We employed a variety of advanced analytical techniques such as electron energy loss spectroscopy (EELS), focused ion beam analysis (FIB) and X-ray photoelectron spectroscopy (XPS) to elucidate the origin of these effects. The conformal 5 nm TiN remains sufficiently intact to limit the growth of the solid electrolyte interphase (SEI), which in turn both improves the overall coulombic efficiency and reduces the life-ending delamination of the nanowire assemblies from the underlying current collector. Our findings should provide a broadly applicable coating design methodology that will improve the performance of any nanostructured LIB anodes where SEI growth is detrimental. © 2013 The Royal Society of Chemistry.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); Security and Disruptive Technologies
Peer reviewedYes
NPARC number21271811
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Record identifier9717b2cd-4586-486a-9615-dcb03a818737
Record created2014-04-22
Record modified2016-05-09
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