Growth of SiO2 at the Sc2O3/Si100 interface during annealing

Alternative titleSilicon Nitride and Silicon Dioxide Thin Films VII
AuthorSearch for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for:
TypeArticle
ConferenceSpring ECS Meeting, March 23-April 1, 2003, Paris, France
Volume2003-02
Pages251261; # of pages: 11
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedNo
NPARC number12346215
Export citationExport as RIS
Report a correctionReport a correction
Record identifier9dcca308-697d-453c-afdd-1f78b51a0bef
Record created2009-09-17
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)