Poly(ether sulfone) as a Negative Resist for Electron-Beam Lithography

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TypeArticle
Journal titleApplied Physics Letters
Volume90
Issue20
PagesArt# 203110
Publication date
AffiliationNRC National Institute for Nanotechnology; National Research Council Canada
Peer reviewedYes
NRC number235
NPARC number8926402
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Record identifiera1b30037-d051-4505-a133-2769f4201893
Record created2009-04-23
Record modified2016-05-09
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